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Chromium Sputtering Target Cr Target Sputtering for TP and TFT

Chromium Sputtering Target Cr Target Sputtering for TP and TFT

Chromium target is of silver white metallic luster. It’s very hard and corrosion resistant, with melting point: 1907℃, the boiling point of 2672℃, density: 7.19g/cm3, purity: 99.5%-99.95%. Chromium has high corrosion resistance. Even in extreme hot state in air, the oxidation is very slow. It is...

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Chromium target is of silver white metallic luster. It’s very hard and corrosion resistant, with melting point: 1907℃, the boiling point of 2672℃, density: 7.19g/cm3, purity: 99.5%-99.95%. Chromium has high corrosion resistance. Even in extreme hot state in air, the oxidation is very slow. It is insoluble in water, so it’s protective plated on metal. It is manufactured through vacuum sintering furnace, hot isostatic pressing, thermal mechanical treatment and precise mechanical processing. It's currently widely used in magnetron sputtering coating for military use, decoration, STN, Ai, TFT, TP, LCD, vehicle navigation, glass, semiconductor, etc..


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