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Magnesium Zinc Sputtering Target MgZn Target Purity 99.9% for STN, TP and TFT

Silicon carbide target is of black metallic luster with conductivity and thermal conductivity, melting point: 2000℃, density: 3.2g/cm3, purity: 99.9%-99.999%. It is manufactured through high temperature sintering and precision machining. Silicon carbide is applied in four major fields:...

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Silicon carbide target is of black metallic luster with conductivity and thermal conductivity, melting point: 2000℃, density: 3.2g/cm3, purity: 99.9%-99.999%. It is manufactured through high temperature sintering and precision machining. Silicon carbide is applied in four major fields: functional ceramics, high-duty refractory, abrasives and metallurgical raw materials. As abrasive material, it can be used for abrasives, such as grinding wheel, stone, grinding head, sand tile, etc.. It can be used for metallurgical deoxidizer and high-temperature- resistant material. High-purity single crystals can be used in manufacturing semiconductors and in manufacturing SiC fibers.


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