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Niobium Sputtering Target Ni Target Purity 4N for STN, TP and TFT

Niobium Sputtering Target Ni Target Purity 4N for STN, TP and TFT

Niobium target is of gray metallic luster, melting point: 2468℃, boiling point: 4742℃, density: 8.57g/cm3, purity: 99.95%. It is manufactured through sintering furnace, hot isostatic pressing, thermal mechanical treatment and precision machining. It’s currently widely used in magnetron...

Product Details

Niobium target is of gray metallic luster, melting point: 2468℃, boiling point: 4742℃, density: 8.57g/cm3, purity: 99.95%. It is manufactured through sintering furnace, hot isostatic pressing, thermal mechanical treatment and precision machining. It’s currently widely used in magnetron sputtering coating for TP, STN, Ai, TFT, LCD, vehicle navigation, glass, semiconductor etc..




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