Product Categories
Social Media

Si Target Silicon Sputtering Si Wafer Silicon Target Polycrystalline for TP and LCD

Silicon is of gray metallic luster. It has diamond lattice and is hard and brittle. Melting point: 1410 °C, boiling point: 2355 °C, density: 2.33g/cm3, purity: 99.999%. It is semiconductor material. Depending on the dopant, it can be N or P type. The silicon wafer is manufactured through vacuum...

Product Details

Silicon is of gray metallic luster. It has diamond lattice and is hard and brittle. Melting point: 1410 °C, boiling point: 2355 °C, density: 2.33g/cm3, purity: 99.999%. It is semiconductor material. Depending on the dopant, it can be N or P type. The silicon wafer is manufactured through vacuum magnetic levitation smelting or casting into ingots earlier, and slicing, lapping and precision machining later. Nowadays it is widely used for metal ceramic, aerospace, optical fiber communication, STN, Ai, TFT, TP, LCD, vehicle navigation, glass, semiconductor and other magnetron sputtering coating.


      图片12.jpg

      图片14.jpg

      图片16.jpg

      图片18.jpg

      图片20.jpg

      图片22.jpg


Related Products
Inquiry