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Tin Oxide Sputtering Target SnO2 Target for STN

Tin Oxide Sputtering Target SnO2 Target for STN

Stannic oxide target is of light yellow, melting point: 1630℃, density: 6.95g/cm3, purity: 99.6%-99.99%. It is manufactured through vacuum sintering furnace, hot isostatic pressing, thermal mechanical treatment and precision machining. It is mainly used in magnetron sputtering coating for...

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Stannic oxide target is of light yellow, melting point: 1630℃, density: 6.95g/cm3, purity: 99.6%-99.99%. It is manufactured through vacuum sintering furnace, hot isostatic pressing, thermal mechanical treatment and precision machining. It is mainly used in magnetron sputtering coating for transparent conductive materials, electromagnetic materials, and used in STN, Ai, TFT, TP, LCD, vehicle navigation, glass, semiconductor sensors, etc..


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