Product Categories
Social Media
Silicon Rotary Sputtering Target Si Rotary Target P/N Type for TP and LCD

Silicon Rotary Sputtering Target Si Rotary Target P/N Type for TP and LCD

Rotary silicon target is of gray metallic luster. It has diamond lattice and is hard and brittle. Melting point: 1410 °C, boiling point: 2355 °C, density: 2.33g/cm3, purity: 99.9%-99.999%. It is semiconductor material. Depending on the dopant, it can be N or P type. The silicon wafer is...

Product Details

Rotary silicon target is of gray metallic luster. It has diamond lattice and is hard and brittle. Melting point: 1410 °C, boiling point: 2355 °C, density: 2.33g/cm3, purity: 99.9%-99.999%. It is semiconductor material. Depending on the dopant, it can be N or P type. The silicon wafer is manufactured through plasma spraying or vacuum magnetic levitation smelting and Bonding. Nowadays it is widely used for metal ceramic, aerospace, optical fiber communication, STN, Ai, TFT, TP, LCD, vehicle navigation, glass, semiconductor and other magnetron sputtering coating.


图片47.jpg

      

      

      

      

      

      

Related Products
Inquiry